发明名称 |
EUV radiation source and method of generating EUV radiation |
摘要 |
An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at the plasma formation location, wherein the collector has a reflective surface that is a modified ellipsoid shape, the modified ellipsoid shape providing improved intensity uniformity of collected EUV radiation in the far field compared with a perfect ellipsoid shape. |
申请公布号 |
US8730454(B2) |
申请公布日期 |
2014.05.20 |
申请号 |
US201113168495 |
申请日期 |
2011.06.24 |
申请人 |
KLAASSEN MICHEL FRANÇOIS HUBERT;ASML NETHERLANDS B.V. |
发明人 |
KLAASSEN MICHEL FRANÇOIS HUBERT |
分类号 |
G03B27/54;G03B27/32;G03B27/52;G03B27/68;G03B27/72 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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