发明名称 |
Methods, devices, and systems for manipulating charged particle streams |
摘要 |
A multiple-deflection blanker for charged particle beam lithography includes a support structure, a first pair of electrodes mounted to the support structure and providing a first electric field, a second pair of electrodes mounted to the support structure and providing a second electric field, at least a third pair of electrodes mounted to the support structure and providing a third electric field, and a surface, such as, an aperture or knife edge, positioned to obstruct a charged particle beam passed through the electric fields. The blanker may include at least a fourth pair of electrodes providing a fourth electric field and apparatus for regulating the time of the excitation of the electric fields. Methods for exposing media to charged particles and aperture holders are also provided. |
申请公布号 |
US8729492(B2) |
申请公布日期 |
2014.05.20 |
申请号 |
US201113809902 |
申请日期 |
2011.07.20 |
申请人 |
RUAN JUNRU;HARTLEY JOHN G.;DENBEAUX GREGORY;THE RESEARCH FOUNDATION FOR THE STATE UNIVERSITY OF NEW YORK |
发明人 |
RUAN JUNRU;HARTLEY JOHN G.;DENBEAUX GREGORY |
分类号 |
H01J37/147;H01J37/04;H01J37/30 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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