| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate. |
| 申请公布号 |
US8730448(B2) |
申请公布日期 |
2014.05.20 |
| 申请号 |
US201213409752 |
申请日期 |
2012.03.01 |
| 申请人 |
NIENHUYS HAN-KWANG;CUIJPERS MARTINUS AGNES WILLEM;TEN KATE NICOLAAS;LEVASIER LEON MARTIN;VAN SCHOOT JAN BERNARD PLECHELMUS;VAN DE VIJVER YURI JOHANNES GABRIËL;VOZNYI OLEG VIACHESLAVOVICH;JANSSEN FRANCISCUS JOHANNES JOSEPH;PHILIPS DANNY MARIA HUBERTUS;MIRANDA MARCIO ALEXANDRE CANO;GALAKTIONOV OLEKSIY;RANJAN MANISH;RIJPMA ALBERT PIETER;BAL KURSAT;VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS;SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS;LEROUX ALAIN LOUIS CLAUDE;ASML NETHERLANDS B.V. |
发明人 |
NIENHUYS HAN-KWANG;CUIJPERS MARTINUS AGNES WILLEM;TEN KATE NICOLAAS;LEVASIER LEON MARTIN;VAN SCHOOT JAN BERNARD PLECHELMUS;VAN DE VIJVER YURI JOHANNES GABRIËL;VOZNYI OLEG VIACHESLAVOVICH;JANSSEN FRANCISCUS JOHANNES JOSEPH;PHILIPS DANNY MARIA HUBERTUS;MIRANDA MARCIO ALEXANDRE CANO;GALAKTIONOV OLEKSIY;RANJAN MANISH;RIJPMA ALBERT PIETER;BAL KURSAT;VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS;SCHMITZ ROGER WILHELMUS ANTONIUS HENRICUS;LEROUX ALAIN LOUIS CLAUDE |
| 分类号 |
G03B27/52;G03B27/42;G03F7/20 |
主分类号 |
G03B27/52 |
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