Immersion photolithography system and method using microchannel nozzles

摘要

A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. The liquid supply system including a plurality of inlets to supply the liquid to the space, the inlets located between the table and a surface of the optical element, the surface arranged to be in contact with the liquid.