发明名称 Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts
摘要 Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D): (A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule; (C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and (D) a solvent.
申请公布号 US8729148(B2) 申请公布日期 2014.05.20
申请号 US20100967163 申请日期 2010.12.14
申请人 ASAI SATOSHI;TAKEDA TAKANOBU;KATO HIDETO;SHIN-ETSU CHEMICAL CO., LTD. 发明人 ASAI SATOSHI;TAKEDA TAKANOBU;KATO HIDETO
分类号 C08J3/28;C08F2/50;C09D183/14;G03C1/73;G03F7/00;G03F7/004;H01L23/29 主分类号 C08J3/28
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