发明名称 |
Photocurable dry film, method for preparing same, patterning method and film for protecting electric and electronic parts |
摘要 |
Disclosed herein is a photocurable dry film including a structure having a photocurable resin layer sandwiched between a support film and a protective film, the photocurable resin layer being formed of a photocurable resin composition including ingredients (A) to (D): (A) a silicone skeleton-containing polymer compound having the repeating units represented by the following general formula (1) wherein X and Y, respectively, a divalent organic group represented by the following general formula (2) or (3) (B) a crosslinking agent selected from formalin-modified or formalin-alcohol-modified amino condensates and phenolic compound having on average two or more methylol groups or alkoxymethylol groups in one molecule; (C) a photoacid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm; and (D) a solvent. |
申请公布号 |
US8729148(B2) |
申请公布日期 |
2014.05.20 |
申请号 |
US20100967163 |
申请日期 |
2010.12.14 |
申请人 |
ASAI SATOSHI;TAKEDA TAKANOBU;KATO HIDETO;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
ASAI SATOSHI;TAKEDA TAKANOBU;KATO HIDETO |
分类号 |
C08J3/28;C08F2/50;C09D183/14;G03C1/73;G03F7/00;G03F7/004;H01L23/29 |
主分类号 |
C08J3/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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