发明名称 |
Method of removing contaminants and native oxides from a substrate surface |
摘要 |
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include exposing a substrate having an oxide layer thereon to an oxidizing source. The oxidizing source oxidizes an upper portion of the substrate beneath the oxide layer to form an oxide layer having an increased thickness. The oxide layer with the increased thickness is then removed to expose a clean surface of the substrate. The removal of the oxide layer generally includes removal of contaminants present in and on the oxide layer, especially those contaminants present at the interface of the oxide layer and the substrate. An epitaxial layer may then be formed on the clean surface of the substrate. |
申请公布号 |
US8728944(B2) |
申请公布日期 |
2014.05.20 |
申请号 |
US201113177409 |
申请日期 |
2011.07.06 |
申请人 |
KUPPURAO SATHEESH;HEMKAR MANISH;TRAN VINH;KIM YIHWAN;APPLIED MATERIAL, INC. |
发明人 |
KUPPURAO SATHEESH;HEMKAR MANISH;TRAN VINH;KIM YIHWAN |
分类号 |
H01L21/311 |
主分类号 |
H01L21/311 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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