发明名称 MAGNETIC FIELD MEASURING APPARATUS AND MAGNETIC FIELD MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To adjust sensitivity to a magnetic field on the basis of an amount of light incident into a cell.SOLUTION: A magnetic field measuring apparatus 2 comprises: a gas cell 50 containing alkali metal atoms therein; a driver 124 adjusting power supplied to a heater 122 so that a temperature of the gas cell 50 falls within a predetermined range including a preset temperature; a light source 10 emitting a laser beam interacting with the alkali metal atoms to the gas cell 50; an optical fiber 30 guiding the laser beam from the light source 10 toward the gas cell 50; a light amount monitor 121 measuring an amount of the laser beam passing through the optical fiber 30; and a control section 125 controlling the preset temperature adjusted by the driver 124 on the basis of the amount of the laser beam measured by the light amount monitor 121.
申请公布号 JP2014092445(A) 申请公布日期 2014.05.19
申请号 JP20120242847 申请日期 2012.11.02
申请人 SEIKO EPSON CORP 发明人 UENO HITOSHI
分类号 G01R33/26 主分类号 G01R33/26
代理机构 代理人
主权项
地址