发明名称 LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM
摘要 <p>PROBLEM TO BE SOLVED: To provide a liquid immersion member capable of suppressing occurrence of an exposure defect.SOLUTION: A liquid immersion member 5 includes a first member 21 which is arranged at at least a part of a periphery of an optical member, and a second member 22 which is arranged below the first member 21 at at least a part of a periphery of an optical path K of exposure light, and has a second upper surface 252 opposed to a first lower surface 261 of the first member 21 across a gap and a second lower surface 262 that a body can face. The second member 22 includes a first part 221 and a second part 222 arranged outside the first part 221 about the optical path K. The second part 222 is moved in a first direction substantially parallel with the optical axis of the optical member through the operation of a driving apparatus 27 in at least a part of a period in which the body moves in a plane substantially parallel with the optical axis.</p>
申请公布号 JP2014093479(A) 申请公布日期 2014.05.19
申请号 JP20120244476 申请日期 2012.11.06
申请人 NIKON CORP 发明人 SATO MASAMICHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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