| 摘要 |
The mixture of steam is avoided between adjacent deposition heads and the reduction of exhaust efficiency is suppressed. A film forming apparatus includes a processing container, a transfer device, a plurality of deposition heads, a partition, and an exhaust device. The processing container dividedly forms the processing chamber for processing a substrate. The transfer device transfers the substrate on a transfer path which is extended in the processing chamber in a preset direction. The deposition heads are arranged in the processing chamber in the preset direction and spray gas including the steam of a deposition material to the film forming surface of the substrate transferred on the transfer path by the transfer device. The exhaust device is connected to each receiving chamber by interposing an exhaust port formed in each receiving chamber and exhaust the surrounding of the deposition head. |
