发明名称 METHOD FOR MANUFACTURING OZONE GAS DISSOLVED WATER AND METHOD FOR CLEANING ELECTRONIC MATERIAL
摘要 <p>PROBLEM TO BE SOLVED: To manufacture ozone gas dissolved water in which dissolved ozone gas concentration is high and bubbling of oxygen gas is suppressed at a place of use, and to efficiently clean an electronic material by using the manufactured ozone gas dissolved water while avoiding troubles such as uneven cleaning and damage on instruments caused by the bubbles.SOLUTION: When manufacturing ozone gas dissolved water by supplying a mixed gas of ozone gas and oxygen gas and water to an ozone dissolution unit to dissolve the mixed gas in the supplied water, an amount of the mixed gas supplied to the ozone dissolution unit is controlled such that a sum of an amount of oxygen gas in the mixed gas, when assuming all ozone in the mixed gas is decomposed into oxygen, and an amount of dissolved oxygen in the supplied water becomes equal to or less than saturation solubility of oxygen gas under a condition of using the acquired ozone gas dissolved water.</p>
申请公布号 JP2014093357(A) 申请公布日期 2014.05.19
申请号 JP20120241891 申请日期 2012.11.01
申请人 KURITA WATER IND LTD 发明人 TOKOSHIMA HIROTO;MORITA HIROSHI
分类号 H01L21/304;B08B3/08 主分类号 H01L21/304
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