发明名称 STENCIL MASK
摘要 <p>PROBLEM TO BE SOLVED: To prevent chipping which occurs when using a stencil mask.SOLUTION: A membrane layer 10 has a stencil pattern 13 made of a brittle material and penetrating in a thickness direction formed thereon, and has a thin film shape. A support substrate layer (support substrate) 30 is made of a brittle material, extends along the periphery of the membrane layer 10 on one surface of the membrane layer 10 in the thickness direction to have an external surface continuous to an outer peripheral surface of the membrane layer 10, and has a frame-like shape. The other surface of the membrane layer 10 in the thickness direction is defined as a mask front face, the outer peripheral surface of the membrane layer 10 and the external surface of the support substrate layer are defined as mask side faces, and an end surface positioned at the opposite side of the membrane layer 10 on the support substrate layer is defined as a mask rear face. At either or both of a first corner 50A where the mask front face and the mask side face intersect with each other and a second corner 50B where the mask side face and the mask rear face intersect with each other, a chipping prevention part is arranged to prevent chipping.</p>
申请公布号 JP2014093511(A) 申请公布日期 2014.05.19
申请号 JP20120245235 申请日期 2012.11.07
申请人 TOPPAN PRINTING CO LTD 发明人 SHIOMITSU KAZUHIKO
分类号 H01L21/027;G03F1/20 主分类号 H01L21/027
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