CORRECTION METHOD OF LAYOUT PATTERN

摘要

PROBLEM TO BE SOLVED: To shorten time taken for OPC processing of a photomask pattern.SOLUTION: A correction method of a layout pattern includes: a process in which a function block region corresponding to a function block is detected from a layout pattern of an integrated circuit; a process in which a size to divide the function block region is determined based on a pattern density of the function block region; a process in which the function block region is divided to the determined size to generate a unit area; and a process in which the unit area is subjected to OPC processing by a computer.