| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern detection method that can evaluate a deformation amount of a SEM pattern with excellent reproducibility.SOLUTION: A comparison candidate pattern 42b on a SEM image and a design pattern 52b corresponding to the comparison candidate pattern are extracted. Then, a plurality of contour points 47b is extracted from an edge of the comparison candidate pattern 42b, and any one contour point 200 of the plurality of contour points 47b is selected as a measurement point. Further, a prescribed number of contour points 198, 199, 101 and 102 around the measurement point 200 is extracted. Next, a regression line 48a to the measurement point and the extracted contour points 198, 199, 101 and 102, and a measurement line 48b orthogonal to the regression line 48a and passing the measurement point 200 are calculated. Then, a distance between edges of the SEM pattern and the design pattern is calculated along the measurement line 48b. |
