发明名称 METHOD FOR MANUFACTURING MICROLENS ARRAY SUBSTRATE, MICROLENS ARRAY SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a microlens array substrate by which qualities and productivity can be improved, a microlens array substrate, and an electro-optical device and electronic equipment including the microlens array substrate.SOLUTION: The method for manufacturing a microlens array substrate includes steps of: forming a recessed part 13 in a region 11b in an upper surface 11c of a light-transmitting substrate 11; forming an alignment mark 15 in a bottom of the recessed part 13; forming a mask layer 72 on the upper surface 11c of the substrate 11, the mask layer covering the region 11b and provided with an opening 72a in a region 11a; forming a recessed part 14 in the region 11a by etching the substrate 11 through the opening 72a; removing the mask layer 72 from the substrate 11; forming a lens layer 12 on the upper surface 11c of the substrate 11 so as to fill the recessed part 13 and the recessed part 14, the lens layer having light-transmitting property and a refractive index different from that of the substrate 11; and subjecting the lens layer 12 to a flattening process to a degree not to expose the alignment mark 15.
申请公布号 JP2014092601(A) 申请公布日期 2014.05.19
申请号 JP20120241573 申请日期 2012.11.01
申请人 SEIKO EPSON CORP 发明人 FUTAMURA TORU
分类号 G02B3/00;B29D11/00;G02F1/1335;G09F9/00 主分类号 G02B3/00
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