| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate manufacturing apparatus capable of inhibiting excessive temperature rise of a nozzle head.SOLUTION: A stage holds a substrate on which a thin film should be formed. A nozzle head discharges droplets of a thin film material toward the substrate held by the stage. A material supply system supplies the liquid thin film material to the nozzle head. A heater heats at least a part of the material supply system. A cooling mechanism cools the nozzle head. A heat transmission inhibition structure inhibits heat transmission from a heating space where the material supply system is disposed to a cooling space where the nozzle head is disposed.</p> |
