| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing apparatus capable of reducing a data processing time for calculating a parameter relating to a chip which is changed by mirror processing or rotation processing.SOLUTION: A drawing apparatus 100 comprises: a shot count map creation section 40 for creating a map defining a parameter relating to a chip including a plurality of graphic patterns for each mesh region obtained by virtually dividing a region including the chip into a plurality of mesh regions in a mesh state; a switching section 50 in which, when performing data processing of at least either inverting or rotating chip data of a chip around the chip center of the chip or around the region center of the region, parameters defined for each mesh region of the map are switched correspondingly to positions of graphic patterns after the data processing; and a drawing section 150 for drawing, on a sample, the graphic patterns within the chip on which the data processing of at least either inversion or rotation has been performed, while using charged particle beams. |
