| 摘要 |
<p>PROBLEM TO BE SOLVED: To achieve an improvement in throughput while forming a highly precise pattern.SOLUTION: In a maskless exposure apparatus for forming a circuit pattern or the like by using a DMD or the like, an image dividing optical system 27 is provided between a projection optical system 26 for forming a pattern image on a substrate W and the substrate W. The image dividing optical system 27 is constituted of optical elements 28A, 28B, and 28C and optical elements 29A, 29B, and 29C. The image dividing optical system 27 divides pattern light from the projection optical system 26 into three.</p> |
