SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

摘要

A substrate treatment method comprises; a rinsing step of supplying a rinse liquid to the upper side of a substrate which is maintained as a vertical posture on a substrate maintaining unit; an organic solvent supplying step of forming a liquid film of an organic solvent on the upper side by supplying the organic solvent to the upper side of the substrate maintained on the substrate maintaining unit to substitute the organic solvent of a predetermined liquid having a low surface tension than the rinse liquid for the rinse liquid attached to the upper side of the substrate including an air gap of a micro-pattern; a high temperature maintaining step of forming a vapor phase film of the organic solvent on the whole upper side of the substrate including the air gap of the micro-pattern and forming a liquid film of the organic solvent on the upper side of the vapor phase film by maintaining the upper side of the substrate maintained on the substrate maintaining unit with a predetermined high temperature higher than the boiling point of the organic solvent; and an organic solvent excluding step of excluding the liquid film of the organic solvent from the upper side of the substrate maintained on the substrate maintaining unit.