发明名称 |
METHOD FOR MANUFACTURING FAN-OUT LINES ON ARRAY SUBSTRATE |
摘要 |
A method for manufacturing fan-out lines on an array substrate is disclosed. The fan-out lines comprise an amorphous silicon layer, an ohmic contact layer and a source-drain electrode layer disposed on a gate insulating layer. The manufacturing processes can be conducted by forming a first layer of photoresist on the source-drain electrode layer and performing a half-exposure development process on the first layer of photoresist; etching the amorphous silicon layer, the ohmic contact layer and the source-drain electrode layer by an etching process; removing the first layer of photoresist; foiming a second layer of photoresist and performing full-exposure development process on the second layer of photoresist; and etching the amorphous silicon layer by etching process to form the fan-out lines. |
申请公布号 |
US2014134809(A1) |
申请公布日期 |
2014.05.15 |
申请号 |
US201314077770 |
申请日期 |
2013.11.12 |
申请人 |
BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.;BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
BAI JINCHAO;SUN LIANG;DING XIANGQIAN;LI LIANGLIANG;LIU YAO |
分类号 |
H01L27/12 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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