发明名称 METHOD FOR FABRICATING A PATTERNED RETARDER
摘要 A method for fabricating a patterned retarder includes bonding first trans-missive substrate that has a patterned photomask layer to a front surface of second light-transmissive substrate, and forming a photo-orientable layer on a rear surface of the second light-transmissive substrate such that a distance between the photomask layer and the photo-orientable layer is relatively small. Linear polarized light is allowed to pass through light-transmissive regions in the photomask unit to irradiate first regions of the photo-orientable layer. Due to the small distance, the polarized light can be either collimated light or uncollimated light.
申请公布号 US2014130968(A1) 申请公布日期 2014.05.15
申请号 US201314076947 申请日期 2013.11.11
申请人 FAR EASTERN NEW CENTURY CORPORATION 发明人 HUNG WEI-CHE;WU YU-JUNE;CHIOU DA-REN
分类号 G02B5/30 主分类号 G02B5/30
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