发明名称 |
METHOD FOR FABRICATING A PATTERNED RETARDER |
摘要 |
A method for fabricating a patterned retarder includes bonding first trans-missive substrate that has a patterned photomask layer to a front surface of second light-transmissive substrate, and forming a photo-orientable layer on a rear surface of the second light-transmissive substrate such that a distance between the photomask layer and the photo-orientable layer is relatively small. Linear polarized light is allowed to pass through light-transmissive regions in the photomask unit to irradiate first regions of the photo-orientable layer. Due to the small distance, the polarized light can be either collimated light or uncollimated light. |
申请公布号 |
US2014130968(A1) |
申请公布日期 |
2014.05.15 |
申请号 |
US201314076947 |
申请日期 |
2013.11.11 |
申请人 |
FAR EASTERN NEW CENTURY CORPORATION |
发明人 |
HUNG WEI-CHE;WU YU-JUNE;CHIOU DA-REN |
分类号 |
G02B5/30 |
主分类号 |
G02B5/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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