发明名称 TCCT MATCH CIRCUIT FOR PLASMA ETCH CHAMBERS
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of improving a TCCT match circuit for plasma etch chambers.SOLUTION: A match circuit includes: a power input circuit coupled to an RF source; an inner coil input circuit coupled between the power input circuit and an input terminal of an inner coil, the inner coil input circuit including an inductor and a capacitor coupled in series to the inductor, the inductor connecting to the power input circuit, and the capacitor connecting to the input terminal of the inner coil, a first node being defined between the power input circuit and the inner coil input circuit; an inner coil output circuit coupled between an output terminal of the inner coil and ground, the inner coil output circuit defining a direct pass-through connection to ground; an outer coil input circuit coupled between the first node and an input terminal of an outer coil; and an outer coil output circuit coupled between an output terminal of the outer coil and ground.</p>
申请公布号 JP2014089957(A) 申请公布日期 2014.05.15
申请号 JP20130218772 申请日期 2013.10.22
申请人 LAM RESEARCH CORPORATION 发明人 MAOLIN LONG ; RICKY MARSH ; ALEX PATERSON
分类号 H05H1/46;H01L21/3065 主分类号 H05H1/46
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