| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of manufacturing a reflective mask capable of avoiding phase defects with accuracy, in a method of manufacturing a reflective mask for forming a multilayer reflection layer on a substrate surface and forming a pattern by an absorber layer.SOLUTION: A fiducial mark is formed on a multilayer reflection layer formed on a substrate surface, and positioning is performed by using the fiducial mark. Substrate inspection on the multilayer reflection layer is performed to measure an accurate phase defect position. A shift amount for shifting data of a pattern is calculated so that a pattern formed by an absorber layer includes the phase defect position. A resist is formed on the multilayer reflection layer. The pattern data is shifted, and then light exposure and development are performed to form the resist pattern. The absorber layer is formed. The resist pattern is peeled off to form the pattern by the absorber layer.</p> |
