发明名称 Techniques for Marking a Substrate Using a Physical Vapor Deposition Material
摘要 Techniques, processes and structures are disclosed for providing markings on products, such as electronic devices. For example, the markings can be formed using physical vapor deposition (PVD) processes to deposit a layer of material. The markings or labels may be textual and/or graphic. The markings are deposited on a compliant layer that is disposed on a surface to be marked. The compliant layer is arranged to isolate the surface to be marked from the layer of material deposited using the PVD process.
申请公布号 US2014134429(A1) 申请公布日期 2014.05.15
申请号 US201414161493 申请日期 2014.01.22
申请人 APPLE INC. 发明人 WEBER DOUGLAS;PREST CHRISTOPHER;PAKULA DAVID;ZADESKY STEPHEN PAUL
分类号 C23C14/04;B32B15/04;C23C14/02 主分类号 C23C14/04
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