| 摘要 |
<p>The present invention relates to a pattern formation method which includes a step of forming a block copolymer containing acyl which has six or more carbon atoms on a side chain and polysytrene derivatives in the opening part of a resist layer which provides a lower layer and has the opening part; a step of forming a second layer containing acyl and a first layer which contains polysytrene derivatives in the opening part by phase-separating the block copolymer; and a step of removing the second layer.</p> |
