| 摘要 |
PROBLEM TO BE SOLVED: To provide systems and methods of performing edge ramping for stabilizing plasma even if power values of one of RF signals change and plasma impedance changes.SOLUTION: A system 190 includes a base RF generator 102 for generating a first RF signal. The first RF signal transitions from one state to another, resulting in a change in plasma impedance. The system 190 further includes a secondary RF generator 112 for generating a second RF signal. The second RF signal transitions from one state to another to stabilize the change in the plasma impedance. The system 190 includes a controller coupled to the secondary RF generator 112. The controller is used for providing parameter values to the secondary RF generator to perform edge ramping of the second RF signal when the second RF signal transitions from one state to another. |
