| 摘要 |
PROBLEM TO BE SOLVED: To provide a curable composition for imprint, capable of reducing mold release strength while maintaining pattern transfer performance.SOLUTION: A curable composition for imprinting contains (A) a polyfunctional polymerizable compound, (B) a photopolymerization initiator, and (C) an additive that has a structure selected from among the following structures (1) and a structure selected from among the following structures (2). (1) includes a polyalkylene oxide structure, a polyalkylene glycol ether structure, a polyalkylene glycol ester structure, an amine structure, a phosphoric acid ester group, a sulfonyl group and a sulfuric acid ester group. (2) includes an alkyl structure having 15 or more carbon atoms, an alicyclic structure, a urethane structure and a silicone structure. |
