VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus capable of maintaining a state in which vapor blown out of a vapor deposition source is always deposited on a substrate by alternately carrying out a vapor deposition stage and a vapor deposition pre-stage for a substrate installed in each vapor deposition region by a simple mechanism without moving the vapor deposition source between two vapor deposition areas.SOLUTION: A vapor deposition chamber 4 in which a first vapor deposition area 2 for vapor deposition on one substrate and a second vapor deposition area 3 for vapor deposition on the other substrate 1 is provided with a vapor deposition source 7 having a first vapor blowout part 5 for sticking a vapor deposition material on the one substrate 1 and a second vapor deposition blowout part 6 for sticking a vapor deposition material on the other substrate 1 arranged in the first vapor deposition area 2 and second vapor deposition area 3, and the vapor deposition source 7 is provided with vapor blowout part switching means 10 of performing switching so that vapor is blown out of only one of the first vapor deposition blowout part 5 and second vapor deposition blowout part 6, so that vapor deposition is carried out selectively on one of the substrates 1 in the first vapor deposition area 2 and second vapor deposition area 3.