发明名称 VERTICAL GaN JFET WITH LOW GATE-DRAIN CAPACITANCE AND HIGH GATE-SOURCE CAPACITANCE
摘要 An embodiment of a vertical power device includes a III-nitride substrate, a drift region coupled to the III-nitride substrate and comprising a III-nitride material of a first conductivity type, and a channel region coupled to the drift region and comprising a III-nitride material of the first conductivity type. The vertical power device also includes a source region coupled to the channel region and comprising a III-nitride material of the first conductivity type, and a gate region coupled to the channel region. The gate region includes a III-nitride material of a second conductivity type. The vertical power device further includes a source-coupled region coupled to the drift region and electrically connected with the source region. The source-coupled region includes a III-nitride material of the second conductivity type.
申请公布号 US2014131775(A1) 申请公布日期 2014.05.15
申请号 US201213675694 申请日期 2012.11.13
申请人 AVOGY, INC. 发明人 DISNEY DONALD R.
分类号 H01L27/085;H01L21/04 主分类号 H01L27/085
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