| 摘要 |
PROBLEM TO BE SOLVED: To provide a new low-detect rate multilayer window polishing pad constitution for reducing window leakage to a sub-pad layer.SOLUTION: A polishing layer interface area and a porous sub-pad layer interface area are formed, and the areas are fixed to a porous sub-pad layer without an adhesive, and an adhesive layer is coated on an under surface of the porous sub-pad layer, and an inside opening extends up to a polishing surface 14 by penetrating through a multilayer chemical-mechanical polishing pad 10, and a light transmissive window element 40 is arranged in the inside opening, and contacts with the inner peripheral edge of the porous sub-pad layer, and the light transmissive window element is adhered to a pressure sensitive adhesive layer, and the porous sub-pad layer is applied to first critical compressive force, and forms a first irreversibly crushed high densifying area of the porous sub-pad layer, and the porous sub-pad layer is applied to second critical compressive force in the porous sub-pad layer, and forms a second irreversibly crushed high densifying area of the porous sub-pad layer, and the polishing surface is adapted for polishing a base material. |
