发明名称 POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a polishing device having an atomizer cover that can prevent as much as possible liquid rebounding from a polished surface from remaining on an inner peripheral surface and further can be comparatively easily cleaned by cleaning liquid.SOLUTION: The polishing device comprises: a rotatable polishing table 12 with a polishing face 10a; and an atomizer 40 whose upper face is covered with an atomizer cover 42 and which injects fluid against the polishing face 10a of the polishing table 12 to clean the polishing face 10a. The atomizer cover 42 has: a semicircle-shaped apical plate 50 in which a first arc-shaped apical plate 50a having a contant radius and a second arc-shaped apical plate 50b with a radius gradually decreasing from the base end toward the apical end are connected to each other at the top thereof; and a pair of lateral plates 52 and 54 that continuously hang down from the apical plate 50.
申请公布号 JP2014087908(A) 申请公布日期 2014.05.15
申请号 JP20120240394 申请日期 2012.10.31
申请人 EBARA CORP 发明人 UMEMOTO MASAO;ERIGUCHI MASAAKI;SONE CHUICHI;AIZAWA HIDEO;KOSUGE RYUICHI
分类号 B24B37/34;H01L21/304 主分类号 B24B37/34
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