| 摘要 |
<p>PROBLEM TO BE SOLVED: To perform deposition while uniformly mixing deposition materials by narrowing the distance between vessels, thereby solving the problem that in the case of co-deposition, the distance between vessels becomes large because of slanting even a heater that surrounds the vessel for housing deposition materials, which results in difficulty in uniformly mixing the deposition materials.SOLUTION: This invention relates to a vessel for housing the deposition materials disposed on the deposition source of a deposition device, the vessel having an opening part and a guide part. By using such a vessel, an angle of a first deposition material darting out of the first opening is adjusted by a first guide part, thereby conducting co-deposition while mixing uniformly.</p> |
