发明名称 VACCUM APPARATUS, PRESSURE CONTROLLING METHOD THEREOF AND ETCHING METHOD
摘要 A vacuum device which controls pressure within a processing container through an APC valve suppresses a rapid pressure change. According to priority of step S1~S5, a pressure change within a processing container (1) can be suppressed. In a step S1, an EC (81) obtains an opening ratio of an APC valve (55). In a step S2, it is determined that the opening ratio of the APC valve (55) obtained in the step S1 exceeds a first threshold value by determining the opening ratio of the EC (81). If the opening ratio exceeds the first threshold value in the step S2, an exceeding counter (124) integrates an exceeding count value in a step S3. In a step S4, it is determined that an integration value of the exceeding count value counted in the exceeding counter (124) exceeds a second threshold value. If the exceeding count value exceeds the second threshold value, a flow control unit (121a) transmits a control signal to reduce a flux of processing gas as a predetermined amount regarding a mass flow controller (MFC) (43) by passing an MC (83).
申请公布号 KR20140059128(A) 申请公布日期 2014.05.15
申请号 KR20130129192 申请日期 2013.10.29
申请人 TOKYO ELECTRON LIMITED 发明人 YAMAMOTO KOHJI;HIROSE HIROSHI
分类号 H01L21/3065;H01L21/02 主分类号 H01L21/3065
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