| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of controlling distribution of plasma generated in a processing container by simple means.SOLUTION: A slow-wave plate 33 comprises: a disk member 115 made of a flat plate having substantially the same area as a planar antenna plate 31; and a ring-shaped member 117 disposed over the disk member 115 in an overlapping manner. The ring-shaped member 117 is formed so as to have a smaller area than the disk member 115. Each of the disk member 115 and the ring-shaped member 117 is made of a dielectric body. A region immediately above the disk member 115 is an air gap AG except the area where the ring-shaped member 117, which has a predetermined dielectric constant, is present. Therefore, a dielectric constant of a cross section, parallel to a top surface of the planar antenna plate 31, of the region is not uniform.</p> |
