发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device of an embodiment includes: a first transistor having a first source region and a first drain region arranged in a first protruded semiconductor region, a first channel region having a first corner portion in its upper portion in a section perpendicular to a first direction, the first corner portion having a first radius of curvature; a second transistor having a second source region and a second drain region arranged in a second protruded semiconductor region, and a second channel region having a second corner portion in its upper portion in a section that is perpendicular to a second direction, the second corner portion having a second radius of curvature greater than the first radius of curvature.
申请公布号 US2014131811(A1) 申请公布日期 2014.05.15
申请号 US201314072948 申请日期 2013.11.06
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SAITOH MASUMI;OTA KENSUKE;NUMATA TOSHINORI;TANAKA CHIKA;YASUDA SHINICHI;TATSUMURA KOSUKE;ZAITSU KOICHIRO
分类号 H01L27/11;H01L27/12 主分类号 H01L27/11
代理机构 代理人
主权项
地址