发明名称 Source and Drain Dislocation Fabrication in FinFETs
摘要 A device includes a semiconductor fin over a substrate, a gate dielectric on sidewalls of the semiconductor fin, and a gate electrode over the gate dielectric. A source/drain region is on a side of the gate electrode. A dislocation plane is in the source/drain region.
申请公布号 US2014131812(A1) 申请公布日期 2014.05.15
申请号 US201213673676 申请日期 2012.11.09
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, L;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WU ZHIQIANG;HSIEH WEN-HSING;CHEN HUA FENG;WU TING-YUN;DIAZ CARLOS H.;CHENG YA-YUN;SHEN TZER-MIN
分类号 H01L27/088;H01L21/8234 主分类号 H01L27/088
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