发明名称 SYSTEM AND METHOD FOR DETECTING CRACKS IN A WAFER
摘要 <p>A wafer crack detection system includes a rotational wafer stage assembly configured to secure a wafer and selectively rotate the wafer, a light source positioned on a first side of the wafer and configured to direct a light beam through the wafer, a sensor positioned on a second side of the wafer and configured to monitor one or more characteristics of light transmitted through the wafer as the wafer is rotated, and a controller communicatively coupled to the sensor and a portion of the rotational wafer stage assembly, the controller configured to: determine the presence of one or more cracks in the wafer based on the monitored one or more characteristics of light transmitted through the wafer, and, responsive to the determination of the presence of one or more cracks in the wafer, direct the rotational stage assembly to adjust the rotational condition of the wafer.</p>
申请公布号 WO2014074861(A1) 申请公布日期 2014.05.15
申请号 WO2013US69209 申请日期 2013.11.08
申请人 KLA-TENCOR CORPORATION 发明人 VANHOOMISSEN, WILLIAM;WHEELER, SEAN
分类号 H01L21/66;H01L21/20 主分类号 H01L21/66
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