Method for monitoring film growth during surface coating of substrate used in dispersive mirror production, involves computing degree and quality of film growth from spectral phase acquired from partial beams interference measurements

摘要

The method involves placing two partial beams of electromagnetic radiation from a radiation source to interfere. The interference measurements of the partial beams are carried out. The electromagnetic radiation is used with several different frequencies. A spectral phase is determined from the interference measurements. The degree and quality of the film growth are computed by a control value from the spectral phase. The control value is group delay calculated by deriving the unique spectral phase according to the optical frequency. An independent claim is included for device for coating surface of substrate.