发明名称 METHOD FOR PRODUCING POLYCRYSTALLINE SILICON
摘要 PROBLEM TO BE SOLVED: To provide a method for producing polycrystalline silicon capable of stably producing polycrystalline silicon having a density extremely close to a true density in a melting deposition process.SOLUTION: When silicon deposited on a vertical reaction tube 1 is melted and dropt so as to be recovered in a receiving vessel 8 installed in the directly lower part of the vertical reaction tube, in a meanwhile in which the recovered silicon is present in a melted state in the receiving vessel, the ratio of an inert gas hard to be solved to the molten silicon is controlled to 50 vol.% or higher.
申请公布号 JP2014088275(A) 申请公布日期 2014.05.15
申请号 JP20120238288 申请日期 2012.10.29
申请人 TOKUYAMA CORP 发明人 NISHIKAWA MASAYOSHI;SAKIDA MANABU;WAKAMATSU SATOSHI
分类号 C01B33/03;C01B33/02 主分类号 C01B33/03
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