| 摘要 |
PROBLEM TO BE SOLVED: To provide a non-ionic optical acid generator having high photosensitivity to i ray, excellent in thermal stability and solubility into hydrophobic materials, and to provide a resin composition for photo-lithography containing the same.SOLUTION: There are provided a non-ionic optical acid generator (A) represented by the general formula (1) and a resin composition for photo-lithography (Q) containing the non-ionic optical acid generator (A). In the formula (1), x is an integer of 1 to 8, y is an integer of 3 to 17, R represents a phenyl group, a biphenyl group or a naphthyl group may have a substituent (T), L represents -O-, -SO-, -SO-, -CO-, -COO-, -CONH-, an alkylene group having 1 to 3 carbon atoms, -CH=CH-, -C≡C- or a phenylene group. |
