PATTERNED-FILM PRODUCTION DEVICE AND PRODUCTION METHOD

摘要

Provided are a patterned-film production device and method, with which a patterned film having a striped pattern exhibiting highly precise individual line width and highly precise spacing between each line can be efficiently produced. This production device produces a patterned phase-difference film. A light exposure device provided to the production device irradiates, with illumination light from a light source unit, via a mask unit, a film being continuously conveyed. The mask unit is provided with a first mask and a second mask which are disposed with a distance (D) therebetween. A plurality of slits arranged in the width direction of the film are formed respectively in the first mask and the second mask. The first mask and the second mask are assembled such that the respective slits thereof completely overlap each other in the light path of the illumination light.