发明名称 CLEANING SOLUTION COMPOSITION FOR OFFSET-PRINTING CLICHE AND CLEANING METHOD USING THE SAME
摘要 The present invention relates to a cleaning solution composition for an offset printing gravure plate and a cleaning method using the same and, more specifically, to a cleaning solution composition for an offset printing gravure plate which includes an alkali compound, a protonic polar solvent, and a nonprotonic polar solvent, and does not contain an anticorrosive agent and a fluoro compound not to damage the gravure plate having micro pattern, rapidly, regularly, and simultaneously removes solidified ink, which includes ink for both BM and RGB remaining in the gravure plate after printing, to obtain reproducibility of the printing pattern, and applies the direct cleaning process during the offset process to be consecutively performed to improve the process yield and productivity.
申请公布号 KR20140058857(A) 申请公布日期 2014.05.15
申请号 KR20120125212 申请日期 2012.11.07
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 LEE, YU JIN;KO, KYUNG JUN;KIM, SUNG SIK
分类号 C11D1/40;C11D3/43 主分类号 C11D1/40
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