发明名称
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a conductive pattern formation substrate and the conductive pattern formation substrate, in which manufacture is easy without spending time for formation of a wiring region, a high quality transparent conductive film having a hardly visible conductive pattern can be formed in a display region, and electrical reliability is improved by fully securing insulating properties of an insulating part of the transparent conductive film. <P>SOLUTION: The method of manufacturing the conductive pattern formation substrate includes: a step of forming a base film a having mesh-like members disposed in a transparent base material in the display region 13 and the wiring region 15 on the insulating substrate 11; a step of forming a wiring line 14 in the wiring region 15 on the base film a; a step of forming a mask means 50 in a part corresponding to the display region 13 on the base film a and removing the part except the part corresponding to the wiring line 14 in the wiring region 15 out of the base film a by dry-etching; and a step in which cavities are formed by irradiating the part corresponding to the display region 13 out of the base film a with laser beam L to make a transparent conductive film 12. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5490033(B2) 申请公布日期 2014.05.14
申请号 JP20110023963 申请日期 2011.02.07
申请人 发明人
分类号 H05K3/08;G06F3/041;G09F9/00;H01B5/14;H01B13/00;H05K3/06 主分类号 H05K3/08
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