| 摘要 |
A first grating (39Y 1 , 39Y 2 ) is placed on the upper surface of wafer stage WST, and on the +Y side of the first grating, a calibration area is arranged where an auxiliary grating (39Y 3 , 39Y 4 ) is formed. By performing a predetermined calibration process using the calibration area, such as a calibration process related to position measurement of the wafer stage using a head (64y 1 , 64y 2 ) and the like of an encoder, it becomes possible to perform position control of the wafer stage in the predetermined direction with good precision using the encoder after the calibration process. |
