发明名称 |
DEBRIS REMOVAL IN HIGH ASPECT STRUCTURES |
摘要 |
A method of debris removal is provided. The method includes positioning a nanometer-scaled tip adjacent to a piece of debris on a substrate. The method also includes adhering the piece of debris to the tip. In addition, the method also includes removing the piece of debris from the substrate by moving the tip away from the substrate. |
申请公布号 |
EP2198451(A4) |
申请公布日期 |
2014.05.14 |
申请号 |
EP20080832334 |
申请日期 |
2008.09.16 |
申请人 |
RAVE LLC |
发明人 |
ROBINSON, TOD EVAN;ARRUZA, BERNABE J.;ROESSLER, KENNETH GILBERT |
分类号 |
H01L21/304;B03C7/00;B08B1/00;B08B7/00 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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