| 摘要 |
The present invention relates to a thin film deposition apparatus and a substrate processing apparatus comprising the same. According to the present invention, the film deposition apparatus includes a chamber, a gas supply part supplying at least one among a process gas and a purge gas in the chamber, and a substrate transfer part moving substrates along a moving path in the chamber. The gas supply part has gas supply modules comprising supply channels supplying one among the process gas and the purge gas in the chamber. The gas supply modules are separated from each other with a predetermined distance and have a discharge channel between the chamber and the gas supply module, as well as to each gas supply module. |
