| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive composition which can form an interlayer insulation film having excellent surface hardness and solvent resistance as well as adequate permeability and voltage retention, excels in storage stability and has adequate radiation sensitivity. <P>SOLUTION: The positive radiation-sensitive composition includes [A] a polymer having a structure unit (1) in which an acetal group is contained in the same or different polymer molecule and a structure unit (2) containing a group in which a structure unit containing an epoxy group and a structure represented by the formula (II) are linked to a nitrogen atom, and [B] an acid generating body. <P>COPYRIGHT: (C)2012,JPO&INPIT |
