| 摘要 |
A charged particle beam exposure system of an embodiment of the present invention is configured to include: a map composition portion creating a map which defines parameters for the chip every mesh area for which the area including the chip with a plurality of graphic patterns is virtually divided into a plurality of mesh areas formed in a mesh shape; a replacement portion corresponding and replacing the parameters defined every mesh area of the map to the position of the graphic patterns after data processing if at least one data processing is performed during the rotation and the inversion of the chip data of the chip, to a pivot of the center of the aforementioned area or the center of the chip; and an exposure unit for exposing the graphic patterns on a sample in the chip at least one data processing is performed among the rotation and the inversion by using charged particle beam. |
