发明名称 Electrostratic Chuck
摘要 An electrostatic chuck includes both a DC power supply and an AC power supply. DC power is supplied to an electrode of the chuck to generate an electrostatic holding force that holds a substrate on the chuck during substrate processing steps. When it is time to remove the substrate from the chuck, the DC power is cut off, and an AC power is applied to help eliminate any residual charge left on the chuck after the DC power has been cut off.
申请公布号 KR101394337(B1) 申请公布日期 2014.05.13
申请号 KR20060083013 申请日期 2006.08.30
申请人 发明人
分类号 H01L21/68 主分类号 H01L21/68
代理机构 代理人
主权项
地址
您可能感兴趣的专利