| 摘要 |
An apparatus for treating fluids with UV comprises a housing for receiving a flow of fluid having a fluid inlet, a fluid outlet, a reaction chamber, and at least a first and second pair of UV sources located in the reactor chamber. The first pair of UV sources has upper and lower UV sources that are positioned relative to each other at a span that is greater than the span between the upper and lower UV sources in the second pair. The second pair is positioned in either the upstream or downstream flow of fluid. Subsequent UV sources or pairs of UV sources may be advantageously used. The apparatus may be combined with a baffle arrangement wherein the baffles are preferably positioned to direct the fluid flow into the treatment area. |
