发明名称 Plating apparatus and plating method
摘要 A method for plating a belt substrate including conveying a belt substrate through a plating tank, contacting an immersed cathode power-supply device and/or an auxiliary cathode power-supply device with the belt substrate conveyed into the interior of the plating tank such that the belt substrate becomes a cathode, and electrically plating a surface of the belt substrate in the interior of the plating tank while the immersed cathode power-supply device and/or the auxiliary cathode power-supply device maintains cathode power-supply to the belt substrate conveyed into the interior portion of the plating tank. The immersed cathode power-supply device and the auxiliary cathode power-supply device are positioned in the interior portion of the plating tank and are electrically connected by a short circuit wiring.
申请公布号 US8721863(B2) 申请公布日期 2014.05.13
申请号 US201113307906 申请日期 2011.11.30
申请人 TACHI YASUAKI;SAWA SHIGEKI;KASUGA TOSHIYUKI;IBIDEN CO., LTD. 发明人 TACHI YASUAKI;SAWA SHIGEKI;KASUGA TOSHIYUKI
分类号 C25D5/00;C25D7/06;C25D17/00 主分类号 C25D5/00
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