发明名称 |
Plating apparatus and plating method |
摘要 |
A method for plating a belt substrate including conveying a belt substrate through a plating tank, contacting an immersed cathode power-supply device and/or an auxiliary cathode power-supply device with the belt substrate conveyed into the interior of the plating tank such that the belt substrate becomes a cathode, and electrically plating a surface of the belt substrate in the interior of the plating tank while the immersed cathode power-supply device and/or the auxiliary cathode power-supply device maintains cathode power-supply to the belt substrate conveyed into the interior portion of the plating tank. The immersed cathode power-supply device and the auxiliary cathode power-supply device are positioned in the interior portion of the plating tank and are electrically connected by a short circuit wiring. |
申请公布号 |
US8721863(B2) |
申请公布日期 |
2014.05.13 |
申请号 |
US201113307906 |
申请日期 |
2011.11.30 |
申请人 |
TACHI YASUAKI;SAWA SHIGEKI;KASUGA TOSHIYUKI;IBIDEN CO., LTD. |
发明人 |
TACHI YASUAKI;SAWA SHIGEKI;KASUGA TOSHIYUKI |
分类号 |
C25D5/00;C25D7/06;C25D17/00 |
主分类号 |
C25D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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